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SEMICON West was our best opportunity to demo the new release of ARCHER™, the most important software development in a decade for XRF analyzers. Managers from headquarters and both coasts also presented the new, cleanroom-ready A Series, which uses polycapillary optics to focus the beam to 7.5 µm FWH - world’s smallest beam size for coating thickness analysis using XRF.
Learn more about this new addition to the Bowman XRF Benchtop suite.
And visit the global “events” page for our trade show calendar. We hope to see you in the next 16 weeks, when Bowman XRFs will be exhibited at 14 major trade shows!
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2 Application Bulletins are now available on PVD coatings, and chromate coatings, technologies where Bowman XRF systems have a strong competitive advantage.
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Also new: an updated brochure for the semiconductor industry.
Access all our documents here: https://bowmanxrf.com/literature/
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Bowman offers the industry’s broadest range of precision XRF plating thickness measurement systems. The O Series with vacuum wafer chuck reads up to 200mm in diameter for under $90K. The A Series pairs seamlessly with automation systems, has the smallest beam size available, the highest precision stage for accurate movement, AND the largest sample capabilities.
8 benchtop XRFs in all, including one that’s best suited – and best-priced – for your needs and test environment. Let us know what you’re looking for.
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Maggie Dechan has joined Bowman as a Standards Technician and Applications Engineer. She formerly worked as a lab technician, using gas chromatography and microbalance instruments. This was an excellent foundation for the Bowman position, where her responsibilities include standards recertifications and application development. She holds a B.S. from the University of Illinois.
Harrison Carcione is Bowman’s new Software Engineer. He has a B.S. in Computer Science from the University of Illinois with a special focus in Computational Linguistics. Carcione’s immediate priority is the enhancement of Archer’s 3D surface mapping capability, which will give users greater pattern flexibility, among other advantages.
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